The global spin-on carbon market is projected to grow from USD 0.22 billion in 2026 to USD 0.81 billion by 2032, registering a CAGR of 24.1%. The market is driven by the increasing demand for advanced lithography materials in the manufacturing of logic, memory, and advanced packaging semiconductors. Growth is further supported by continued node scaling, rising adoption of EUV and multi-patterning techniques, and expanding use of SOC hard masks for improved etch selectivity and pattern fidelity. Additionally, rapid fab expansions, growing OSAT activity, and the push toward low-temperature and process-compatible materials to meet sustainability and efficiency goals are accelerating SOC adoption across global semiconductor manufacturing ecosystems.
KEY
TAKEAWAYS
- Asia Pacific is estimated to
account for a 62.6% share of the spin-on carbon market in 2026 due to the
strong concentration of semiconductor foundries and IDMs, ongoing wafer
fab expansions in China, Taiwan, South Korea, and Japan.
- By type, the normal-temperature
spin-on carbon (NT-SOC) segment is projected to grow at a higher CAGR of
27.1% than the hot-temperature spin-on carbon (HT-SOC) segment from 2026
to 2032.
- By application, the logic devices
segment is estimated to account for a 31.4% share of the spin-on carbon
market in 2026.
- By end user, the foundries
segment accounted for the largest market share in 2025 due to high wafer
volumes and early adoption of advanced lithography and etch processes
requiring spin-on carbon materials.
- SAMSUNG SDI (South Korea),
Shin-Etsu Chemical Co., Ltd. (Japan), and DONGJIN SEMICHEM CO LTD. (South
Korea) were identified as some of the star players in the spin-on carbon
market (global), given their strong market share and extensive product
footprint.
- Pibond Oy (Finland) and
Irresistible Materials (UK), among others, have distinguished themselves
among startups and SMEs by securing strong footholds in specialized niche
areas, underscoring their potential as emerging market leaders.
The
spin-on carbon market is set for robust growth as semiconductor manufacturers
expand advanced lithography and etching processes to improve device
performance, yield, and integration density across logic, memory, and power
applications. Additionally, the rising demand for high-aspect-ratio patterning,
defect-free etch masks, and reliable interlayer dielectrics drives the adoption
of spin-on carbon materials that enable precise pattern transfer,
planarization, hard masking, and next-generation packaging solutions.
The
spin-on carbon market is evolving from a revenue base dominated by standard SoC
materials used in mature and mid-node lithography to high-value growth
opportunities driven by advanced semiconductor manufacturing requirements.
Future revenue expansion over the next 7–10 years is expected to be fueled by
SoC adoption in EUV lithography, advanced multi-patterning, and complex 3D
device integration, supported by the growing demand from foundries, integrated
device manufacturers, and OSAT.
The
spin-on carbon ecosystem includes raw material suppliers, SoC manufacturers,
distributors, and end users. Raw material suppliers, such as carbon precursors
and specialty chemical providers, form the foundation, enabling SoC
manufacturers to formulate high-performance carbon hardmask materials tailored
for advanced lithography nodes. SoC manufacturers work closely with
semiconductor fabs to ensure process compatibility and performance reliability.
Distribution is largely handled through specialized electronic material
division and select distributors provide logistics, formulation support, and
regional access, rather than open third-party resale. Leading semiconductor
foundries and IDMs represent primary end users, driving SoC adoption through
advanced logic and memory fabrication, where increasing patterning complexity
and multi-layer processes continue to reinforce close collaboration across the
entire ecosystem.
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Asia
Pacific to account for largest share in spin-on carbon market during forecast
period
Asia
Pacific is projected to account for the largest share of the spin-on carbon
market during the forecast period. This growth is due to the concentration of
leading semiconductor foundries, IDMs, and OSAT providers in Taiwan, South
Korea, China, and Japan. The region accounts for the majority of global wafer
fabrication capacity, spanning advanced and mature nodes that extensively use
SOC materials in multilayer lithography, etch processes, and advanced
packaging. Additionally, continuous demand for fab expansions, high-volume
manufacturing, and strong electronics further reinforce Asia Pacific’s
dominance.
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