The report "Spin-on Carbon Industry by Type (Hot-Temperature, Normal-Temperature), Application (Logic Devices, Memory Devices, Power Devices, MEMS, Photonics, Advanced Packaging), and End User (Foundries, IDMs & OSAT Vendors) – Global Forecast to 2032”, The Spin-on Carbon industry is projected to grow from USD 0.22 billion in 2026 and to reach USD 0.81 billion by 2032, at a Compound Annual Growth Rate (CAGR) of 24.1% during the forecast period. The spin-on carbon market is driven by the global expansion of wafer fabrication and OSAT capacity, particularly in Asia Pacific, North America, and Europe, and increasing consumption of process materials as new fabs and packaging lines ramp up volume production. Each new fab startup creates a recurring demand for SOC across multiple process layers, ensuring consistent material supply needs for advanced semiconductor manufacturing over the fab’s lifecycle.
By end user, the Integrated
Device Manufacturers (IDMs) & Outsourced Semiconductor Assembly and Test
(OSAT) vendors segment is projected to register the highest CAGR in the spin-on
carbon market due to their critical roles in semiconductor fabrication and
packaging ecosystems. IDMs are increasingly investing in advanced fabs and
process technologies to produce cutting-edge logic and memory chips, which
require reliable SOC materials for lithography, etch, and planarization steps.
Their in-house wafer processing capabilities allow them to rapidly adopt new
SOC formulations optimized for EUV and multi-patterning processes, creating
steady demand growth. Simultaneously, OSATs are expanding globally to support
the rising outsourcing trend in semiconductor assembly and testing,
particularly for advanced packaging solutions, such as fan-out wafer-level
packaging (FOWLP) and 3D ICs. SOC materials are essential in these processes
for achieving high interlayer adhesion, planarity, and defect-free patterning.
The combined effect of IDMs scaling production and OSATs diversifying service
offerings ensures sustained SOC consumption across multiple process layers,
driving these vendors to achieve the fastest market growth during the forecast
period.
“The hot-temperature spin-on
carbon (HT-SOC) segment is projected to lead the market by 2032.”
By type, the hot-temperature
spin-on carbon (HT-SOC) segment is projected to dominate the market by 2032 due
to its superior thermal stability, excellent mechanical strength, and
compatibility with advanced lithography processes, including EUV and complex
DUV multi-patterning. As semiconductor nodes continue to shrink, maintaining
pattern fidelity and reducing line collapse during high-temperature processing
becomes critical. Hot-temperature SOC can withstand extreme thermal cycles
during curing, etching, and chemical-mechanical planarization (CMP), making it
highly reliable for multi-layer interconnect applications in logic, memory, and
photonics devices. Additionally, they offer better adhesion to substrates and
other dielectric layers, minimizing delamination risks and improving overall
wafer yield. The increasing deployment of 3D stacking technologies, such as
TSVs (Through-Silicon Vias) and advanced packaging, further boosts the need for
SOC materials that can endure high thermal budgets. Furthermore, with the
ongoing expansion of advanced fabs in Asia Pacific, North America, and Europe,
the recurring demand for high-performance SOC layers positions hot-temperature
variants as the preferred choice, ensuring they maintain the largest market
share throughout the forecast period.
“Asia Pacific accounted for the
largest share of the spin-on carbon market in 2025.”
Asia Pacific dominated the
spin-on carbon market in 2025 due to the region’s rapid semiconductor industry
growth, driven by massive investments in wafer fabrication and advanced
packaging capacity. Countries such as Taiwan, South Korea, China, and Japan are
home to leading IDM and foundry players like TSMC, Samsung, and SMIC. These
players are continuously expanding their fabrication lines to meet global chip
demand. Each new fab startup and packaging facility requires recurring supplies
of SOC materials for lithography, etch, and planarization processes, ensuring
sustained market consumption. Additionally, the region is at the forefront of
adopting cutting-edge lithography technologies, including EUV and
multi-patterning DUV, where SOC materials are essential to maintain pattern
fidelity, reduce line collapse, and enhance yield. The growing demand for
advanced logic, memory, and photonics devices in Asia Pacific further
accelerates SOC adoption. Combined with a robust supply chain for raw materials
and proximity to leading process material manufacturers, these factors position
Asia Pacific as the largest consumer of spin-on carbon in 2025, accounting for
a significant share of the global market.
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Key Players
Key companies operating in the
spin-on carbon market include SAMSUNG SDI (South Korea), Shin-Etsu Chemical
Co., Ltd. (Japan), DONGJIN SEMICHEM CO LTD. (South Korea), Merck KGaA
(Germany), YCCHEM Co., Ltd. (South Korea), Brewer Science, Inc. (US), JSR
Micro, Inc. (US), Irresistible Materials (UK), KOYJ CO., LTD. (South Korea),
and Nano-C (US), among others.
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